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  • ASTM
    F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
    Edition: 1997
    $144.00
    Unlimited Users per year

Description of ASTM-F1709 1997

ASTM F1709-97

Historical Standard: ASTM F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

SUPERSEDED (see Active link, below)




ASTM F1709

1. Scope

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.


2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

ASTM Standards

E112 Test Methods for Determining Average Grain Size


Keywords

coating; sputtering; target; thin film; titanium; Electronic materials/applications--specifications; Electronic thin-film applications--specifications; High-purity titanium; Sputtering process/targets--specifications; Thin film applications; Titanium sputtering targets; Titanium (Ti)/alloys--specifications;


ICS Code

ICS Number Code 31.120 (Electronic display devices)


DOI: 10.1520/F1709-97

ASTM International is a member of CrossRef.




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